Download e-book for iPad: Advanced Nanomaterials, Two Volume Edition by Kurt E. Geckeler, Hiroyuki Nishide

January 31, 2018 | Nanotechnology | By admin | 0 Comments

By Kurt E. Geckeler, Hiroyuki Nishide

ISBN-10: 3527317945

ISBN-13: 9783527317943

ISBN-10: 3527628959

ISBN-13: 9783527628957

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16 Atomic force microscopy height images showing: (a) the 450 nm photopattern produced through the crosslinking of the PHOST matrix; and (b) the 20 nm-diameter porous substructure generated after removal of the α-methylstyrene block. resistant, low-Tg polymer with a photosensitive polymer that also has a high Tg. The copolymerization of the two monomers is necessary to avoid the inevitable macrophase separation that results when two homopolymers are mixed together. This composite style approach thereby simultaneously satisfies the requirements for high etch resistance, high sensitivity and high Tg, resulting in the best-performing photoresists.

2 μm features are exposed to 19 mJ cm−2 and developed using the same conditions. While the random copolymer is insoluble, pinholes form during development and are thought to originate from phase-separated acid, which is removed by the developer. Reprinted with permission from Ref. [154]; © 2006, American Chemical Society. 1 Structure Direction Using Block Copolymer Scaffolds Besides the potential uses of BCPs as lithographic materials, their inherent microphase separation and chemical dissimilarity of the blocks also leads to other applications.

These materials are referred to as “amphiphilic” due to their dual polar/ nonpolar chemical nature, and can thus dissolve partially in polar or nonpolar media. 6. These micelles form structures with a defined size and shape, depending on the relative molecular weight of the blocks and the ionic strength of the solution. BCPs with large soluble blocks typically form spherical micelles due to small curvature radii, but smaller soluble block lengths can also form cylindrical micelles due to their greater curvature radii.

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Advanced Nanomaterials, Two Volume Edition by Kurt E. Geckeler, Hiroyuki Nishide


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